Symposium H-4
Advanced Plasma Processing in the New Era
Scope
The plasma process is a key technology for the synthesis of functional nanomaterials, which can evolve into industrial fabrication platforms for energy, environmental, and life sciences applications. In addition to various conventional plasma processes, significant attention has been given to novel plasma technologies, including atmospheric-pressure non-thermal plasmas. These have been actively studied for applications in surface modifications and the ultra-high-rate fabrication of functional nanomaterials. The primary objective of this session is to provide an interdisciplinary forum for scientists and engineers working in plasma technologies and nanomaterials.
Topics
- plasma processing
- plasma catalysis
- energy storage
- solar cell
- fuel cell
- battery
- nanomaterials
- CO2 reduction
- thin films
- surface modification
Invited Speakers
- Kyongnam Kim, Daejeon University: Development of Integrated Sensing Technologies for Real-Time Monitoring and Endpoint Detection in Plasma Chamber Processes
- Janez Zavasnik, Jožef Stefan Institute: Plasma-tailored nanostructures with tunable electromagnetic properties
- Ahmad Hamdan, Université de Montréal: Discharge in liquid: a non-conventional setup to synthesize nanomaterials
- Osamu Sakai, The University of Shiga Prefecture: Plasma Processing Designed by Entropy-Based Approaches
- Jyh-Wei Lee, Ming Chi University of Technology: Effects of target poisoning ratios on the fabrication of high entropy alloy carbide thin films by HiPIMS
Organizers
- Representative
Tsuyohito Ito - The University of Tokyo
- Correspondence
Masaharu Shiratani - Kyushu University
siratani[at]ed.kyushu-u.ac.jp
- Makoto Kambara
- The University of Osaka
- Uros Cvelbar
- Jozef Stefan Institute
- Jin-Hyo Boo
- Sungkyunkwan University
- Giichiro Uchida
- Meijo University
